resist profile meaning in Chinese

光刻胶断面图

From the simulation of peb process , we prove that peb could reduce standing wave effects and improve resist development profile . after analyzing the effects of standing wave effects on resist profiles , we bring forward a certain thickness and these effects could be ignored when resist is beyond that value . finally , the characters of thick resist profile are analyzed , and experiment results are also given
同时，在论文中还深入讨论了抗蚀剂折射率变化对光场计算带来的误差；模拟了后烘过程对驻波效应的改善作用，论证了采用适当的后烘工艺改善抗蚀剂光刻质量的作用；分析了驻波效应对厚层抗蚀剂显影轮廓的影响，提出了一个可以忽略驻波效应影响的抗蚀剂厚度条件值；最后还模拟和分析了厚层抗蚀剂显影轮廓特点并给出了实验结果。